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Plasma Deposition of Amorphous Silicon-Based Materials

By: Pio Capezzuto Arun Madan (Author)

Ksh 17,270.00
Format :

Format(s): DRM PDF

ISBN-13: 9780080539102

Publisher: Elsevier Science

Imprint: Academic Press

Publication Date: October 10th, 1995

Country of Publication: US

Language: English

Pages: 324

Physical Edition EAN: 9780121379407

Category: Condensed matter physics (liquid state & solid state physics) , Plasma physics , Optical physics , Electricity, electromagnetism & magnetism , Mechanical engineering & materials , Materials science , Electronics & communications engineering , Electronic devices & materials , Educational: IT & computing, ICT

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  • Description

  • Author Bio

Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices

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